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Chemistry MCQs for NEET — Practice Questions with Answers

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Both $N {({SiH}_{3})}_{3}$ and $NH {({SiH}_{3})}_{2}$ compounds have trigonal planer skeleton. Incorrect statement about both compound is :

SiNSi bond angle in $NH {({SiH}_{3})}_{2}$ $>$ SiNSi bond angle in $N {({SiH}_{3})}_{3}$

$N - Si$ bond length in $NH {({SiH}_{3})}_{2} > N - Si$ bond length in $N {({SiH}_{3})}_{3}$

$N - S i$ bond length in $NH {({SiH}_{3})}_{2} < N - S i$ bond length in $N {({SiH}_{3})}_{3}$

Back bonding strength in $NH {({SiH}_{3})}_{2} >$ Back bonding strength in $N {({SiH}_{3})}_{3}$

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Explanation

(b) $\to$ In $NH {({SiH}_{3})}_{2}$ electron density or lone pair at N-atom is involved in back bonding only with two

empty 3d-orbitals of two silicon atoms while in $N {({SiH}_{3})}_{3}$ it is involed with three empty 3d-orbitals

of three silicon atoms.

$\to$ Strength of back bonding in $NH {({SiH}_{3})}_{2}$ is higher than in $N {({SiH}_{3})}_{3}$ hence $N - Si$ bond length in

$NH {({SiH}_{3})}_{2}$ is less than that of in $N {({SiH}_{3})}_{3}$ .

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The incorrect statement regarding $O {({SiH}_{3})}_{2}$ and ${OCl}_{2}$ molecule is/are:

The strength of back bonding is more in $O {({SiH}_{3})}_{2}$ molecule than ${OCl}_{2}$ molecule

$Si — O — Si$ bond angle in $O {({SiH}_{3})}_{2}$ is greater than $Cl — O — Cl$ bond angle in ${OCl}_{2}$

The nature of back bond in both molecules is $2 p_{σ} ‐ 3 d_{π}$

Hybridisation of central $O ‐ atom$ in both molecules is same

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Which of the following compound have the same no. of lone pair with their central atom?

${XeF}_{5}^{-}$

${BrF}_{3}$

${XeF}_{2}$

$H_{3} S^{+}$

(e) Triple Methylene

options are as follows :

(a) (iv) and (v) (b) (i) and (iii)

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Explanation

${BrF}_{3}$ : 2 lone pairs ; Bent-T-shape

${XeF}_{2}$ : 3 lone pairs ; Linear

$H_{3} S^{+}$ : 1 lone pairs ; Pyramdical

${CH}_{1}^{2}$ : 2 unpaired e s ; Linear

(no lone pair)

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Which of the following order of molecular force of attraction among given species is incorrect?

HI > HBr > $C l_{2}$

$C H_{3} C l > C l_{2} > C C l_{4} > C H_{4}$

n- pentane > iso-pentane > neo-pentane

$O H_{2} > O {(C H_{3})}_{2} > O B r_{2}$

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Explanation

(d) correct order of molecular force : $H_{2} O > O B r_{2} > O (C H_{3})_{2}$

H-bonds

Dipole-dipole $\propto$ molecular mass

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The geometry with respect to the central atom of the following molecules are:

$N ({SiH}_{3})_{3}; {Me}_{3} N; ({SiH}_{3})_{3} P$

planar, pyramidal, planar

planar, pyramidal, pyramidal

pyramidal, pyramidal, pyramidal

pyramidal, planer, pyramidal

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Explanation

The geometry of molecules can be determined by the hybridization of the central atom. N(SiHâ‚ƒ)â‚ƒ has a nitrogen atom with 3 bond pairs and 1 lone pair, giving a pyramidal geometry. Meâ‚ƒN has a nitrogen atom with 4 bond pairs, giving a tetrahedral (pyramidal) geometry. (SiHâ‚ƒ)â‚ƒP has a phosphorus atom with 3 bond pairs and 1 lone pair, giving a pyramidal geometry.

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Incorrect statement regarding ${BF}_{2} {NH}_{2}$ molecule is :

FBF bond angle $< 120 %$

HNH bond angle $> 109 ° 28'$

Exhibits intermolecular H-bond

Hybridization of N-atom is ${sp}^{3}$

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The bond having minimum bond energy is :

$C — C$

$O — O$

$S — S$

$P — P$

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Explanation

(b) Due to inter electronic repulation between lone pairs on both oxygen atoms bond energy of $O — O$

bond is less.

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Which gas should not be collected over water because of its high solubility in water?

$H_{2}$

$N_{2}$

$C H_{4}$

HCl

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Explanation

(d) HCL is highly in water because it ionise in water and form ion-dipole interaction with water

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The correct increasing order of extent of hydrolysis is :

${CCl}_{4} < {MgCl}_{2} < {AlCl}_{3} < {SiCl}_{4} < {PCl}_{5}$

${CCl}_{4} < {AlCl}_{3} < {MgCl}_{2} < {PCl}_{5} < {SiCl}_{4}$

${CCl}_{4} < {SiCl}_{4} < {PCl}_{5} < {AlCl}_{3} < {mgCl}_{2}$

${CCl}_{4} < {PCl}_{5} < {SiCl}_{4} < {AlCl}_{3} < {MgCl}_{2}$

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Explanation

(a) Aqueous hydrolysis of ${CCl}_{4}$ is not possible due to absence of vacant ortibal on carbon, while

hybrolysis of ${MgCl}_{2} < {AlCl}_{3} < {SiCl}_{4} < {PCl}_{5}$ is possible. Extent of hydrolysis is proportional to the

amount of positive formation charge present on the atomic site prone to attack of $H_{2} O$

molecules. ${CCl}_{4} < {MgCl}_{2} < {AlCl}_{3} < {SiCl}_{4} < {PCl}_{5}$

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Low melting point is expected for soild:

Ionic soild

metallic solid

molecular soild

covalent soild

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Explanation

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Yes. You can attempt every Chemistry question on this page for free without logging in, and check the correct answer with a detailed explanation instantly.

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The bank mixes NEET previous year questions (PYQs) with practice questions, each tagged with its exam appearances where applicable.